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TSMC became the first semiconductor company to produce fully-functional 90nm chips using immersion lithography technology. The Company announced the accomplishment at SEMICON Japan in December 2004.

TSMC’s innovative immersion lithography employs a 193nm lithography water media scanner, rather than a conventional 157nm dry scanner, and set new scanner specifications for the global semiconductor industry. This development strengthened TSMC’s technology leadership, helped the semiconductor industry break through barriers defined by Moore’s Law, and moved the entire industry toward more process technology advancements.

Immersion Lithography

Immersion lithography projection differs from its conventional counterpart because it adds water between the lenses and photoresist. Because of water’s 1.44 refractive index, wave lengths of 193nm shrink 144% to 134nm, which raises lens resolution by 44%. This has enables the extension of Moore's Law.

TSMC May 2017 Revenue Report(2017/06/09)
TSMC Sets July 2 as Record Date for Common Share Dividends(2017/06/08)
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