Home > Dedicated IC Foundry > Technology > Logic Technology > 90nm Technology
90nm Technology    
Technology
Future R&D Plans
Logic Technology
5nm Technology
7nm Technology
10nm Technology
16/12nm Technology
20nm Technology
28nm Technology
40nm Technology
65nm Technology
90nm Technology
0.13-micron Technology
0.18-micron Technology
3-micron Technology
Specialty Technology
Manufacturing
Services
Open Innovation Platform®
Grand Alliance

TSMC became the first semiconductor company to produce fully-functional 90nm chips using immersion lithography technology. The Company announced the accomplishment at SEMICON Japan in December 2004.

TSMC's innovative immersion lithography employs a 193nm lithography water media scanner, rather than a conventional 157nm dry scanner, and set new scanner specifications for the global semiconductor industry. This development strengthened TSMC's technology leadership, helped the semiconductor industry break through barriers defined by Moore's Law, and moved the entire industry toward more process technology advancements.


TSMC July 2017 Revenue Report(2017/08/10)
   
TSMC Board of Directors Meeting Resolutions(2017/08/08)
   
Media Contacts

Open Innovation Platform®
Tech Symposiums, Trade Shows, Industry Events & Investor Meetings
TSMC Value Chain Aggregator
Business Contacts
Document Center
TSMC-Onlinenew window
Online information and transaction for our customers.
The web-based portal for smarter supplier interactions.
Member Login
Join TSMC member to get the latest press releases and financial reports.
Find more information about TSMC.
Open Innovation Platform® Home     Contact Us     Site Map     FAQ     Legal Notice & Trademark Information     Privacy Policy
Copyright© Taiwan Semiconductor Manufacturing Company Limited 2010-2017, All Rights Reserved.