90nm Technology

TSMC became the first semiconductor company to produce fully-functional 90nm chips using immersion lithography technology. The Company announced the accomplishment at SEMICON Japan in December 2004.

TSMC's innovative immersion lithography employs a 193nm lithography water media scanner, rather than a conventional 157nm dry scanner, and set new scanner specifications for the global semiconductor industry. This development strengthened TSMC's technology leadership, helped the semiconductor industry break through barriers defined by Moore's Law, and moved the entire industry toward more process technology advancements.

90nm Technology

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